Used for the polishing and cleaning treatment of silicon wafer surfaces.

Used for the rework cleaning treatment of abnormal silicon wafers generated in each process of battery production.

Used for the cleaning treatment of graphite boats.

Used for the cleaning treatment of graphite boats in the PE-POLY route.

Used for the cleaning treatment of quartz boats and quartz tubes in boron diffusion, phosphorus diffusion, LPCVD, etc.

Ozone Water System-Equipped with an imported ozone water concentration detector. Supports a 1-to-many mode, with each channel independently controlling concentration.