Product Name

RCA Cleaning Equipment

Model

KSRCA

Route Application

TOPCON

Function

Used for the removal of LPCVD/PECVD deposited polysilicon

Process Flow

Deposition removal→Post-cleaning→Pickling→Post-cleaning

Compatible Wafer

182x182mm, compatible with various sizes of 18X-230 silicon wafers

Cassette Number

4, 6 cassettes

Capacity

182: ≥16000 pcs/hour; 210: ≥12500 pcs/hour

Breakage Rate

Breakage rate <0.01% (Silicon wafer thickness ≥130um)

Power Consumption/ Voltage

295KW/ 380V 50Hz 3-phase 5-wire system

Features

Supports MES, RFID, and optional online weighing functions; one-key online washing and solution replacement for simple and quick fluid exchange; process tank circulation volume adjustable according to process requirements; compatible with additives from various brands; thorough removal of deposition and thorough cleaning.